scia Magna 200

The scia Magna 200 is designed for precision wafer coatings through the deposition of metals and/or dielectric layers. Its selectable sputter modes and customisable arrangements allow the system to be tailored to meet specific customer requirements. Suitable for both small-scale R&D applications and mass production, the system can be configured in a cluster layout with software-controlled automatic production for optimised efficiency.

Keay Featues:

• RF bias for conformity and stress control
• Superior uniformity with rotatable substrate holder
• Low substrate temperature with helium cooling contact and electrostatic chuck
• High deposition rates with reactive sputtering in unipolar and bipolar mode
• Variation of film properties by adjustable energetic substrate bombardment
• Co-sputtering with confocal arrangement of magnetrons